Characterisation and determination of Ni-P coating sputtering rate

Matijević, Božidar and Ćurković, Lidija and Rede, Vera (2011) Characterisation and determination of Ni-P coating sputtering rate. = Characterisation and determination of Ni-P coating sputtering rate. International Journal of Microstructure and Materials Properties, 6 (6). pp. 479-485. ISSN 1741-8410. Vrsta rada: ["eprint_fieldopt_article_type_article" not defined]. . .

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Electroless nickel (EN) plating coating were prepared using hypophosphite reduced EN bath at pH 4.8-5.6 and temperature 91 ± 3°C. Density of the bath were 1.04 g/cm 3 and deposition rate was 18 μm/hour for plain Ni-P coatings. It enables us to obtain a coating of nickel-phosphorus containing phosphorus at 10 level. The Ni-P coating was characterised by optical microscopy (OM), scanning electron microscopy (SEM) with energy dispersive spectroscopy (EDS) and glow discharge optical emission spectrometry (GDOES). Hardness is determined on a micro hardness tester using a 100 g load. The spattering rate of investigated coating was also determined by GDOES. Copyright © 2011 Inderscience Enterprises Ltd.

Item Type: Article (["eprint_fieldopt_article_type_article" not defined])
Keywords (Croatian): Electroless coating; GDOES; Glow discharge optical emission spectrometry; SEM-EDX; Sputtering rate; Coatings; Energy dispersive spectroscopy; Glow discharges; Hardness; Microhardness; Optical emission spectroscopy; Optical microscopy; Phosphorus; Scanning electron microscopy; Nickel coatings
Divisions: 1000 Department of Materials > 1010 Chair of Materials and Tribology
1000 Department of Materials > 1020 Chair of Heat Treatment and Surface Engineering
Indexed in Web of Science: No
Indexed in Current Contents: No
Citations SCOPUS: 0 (23.4.2015.)
Date Deposited: 23 Apr 2015 12:34
Last Modified: 23 Apr 2015 12:34

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